微电子/电池工业用水处理设备/电子元件纯水设备/三级管超纯水设备/电子半导体高纯水设备。余艳 13073396006，Q:674831270
Pure water fMicro-electronics, batteries industrial
应用领域和指标要求参考
Reference of appli**ions areas indexes required
用途Appli**ions
用水指标Water Indi**ors
参考标准Reference standard
单晶硅、多晶硅、太阳能电池、氧化铝坩埚、光伏玻璃等生产
Monocrystalline silicon, polycrystalline silicon, solar cells, alumina crucible, photovoltaic glass, other production
电阻率15 ~18.25 MΩ.CM
Resitivity15 ~18.25 MΩ.CM
我国电子级水质技术指标，GB11446-1-1997
The water quality of **'s electronic-grade technical indi**ors GB11446-1-1997
美国半导体工业用纯水指标
The industrial pure water indi**ors of U.S. semiconductor
单晶硅半导体集成电路块，显像管、玻壳、液晶显示器等制造工业
Monocrystalline silicon semiconductchips, tubes, glass, liquid crystal displays other manufacturing industries
电阻率15 ~18.25 MΩ.CM
Resitivity15 ~18.25 MΩ.CM
美国半导体工业用纯水指标
The industrial pure water indi**ors of U.S. semiconductor
我国电子级水质技术指标，GB11446-1-1997
** electronic-grade water quality technical specifi**ions GB11446-1-1997
光学材料清洗用水、电子陶瓷行业用纯水、**磁性材料用纯水
Pure water foptical materials, electronic ceramics cutting-edge magnetic materials
电阻率10 ~17 MΩ.CM
Resitivity10 ~17 MΩ.CM
我国电子级水质技术指标，GB11446-1-1997
** electronic-grade water quality technical specifi**ions GB11446-1-1997
美国半导体工业用纯水指标
The industrial pure water indi**ors of U.S. semiconductor
蓄电池、锂电池、锌锰电池生产
Batteries, lithium batteries, zinc-manganese battery production
电阻率5 ~10 MΩ.CM
Resitivity5 ~10 MΩ.CM
我国电子级水质技术指标，GB11446-1-1997
** electronic-grade water quality technical specifi**ions GB11446-1-1997
有色金属、贵金属冶炼用水、纳米级新材料生产用水、航空新材料生产用水、ITO导电玻璃制造用水、电子级无尘布生产用水
Pure water fnon-ferrous metals, precious metals smelting, nano-scale production of new materials, **iation production of new materials, ITO conductive glass, production of electronic-grade fdust-free cloth
电阻率15 ~18.25 MΩ.CM
Resitivity15 ~18.25 MΩ.CM
我国电子级水质技术指标，GB11446-1-1997
** electronic-grade water quality technical specifi**ions GB11446-1-1997
美国半导体工业用纯水指标
The industrial pure water indi**ors of U.S. semiconductor
主要工艺流程和出水指标：
Main technical process standard of output water
※预处理+反渗透+离子交换器（电阻率≥15MΩ.CM）
Pre-treatment+ stage reverse osmosis system+ion exchange (electric conductivity≥15MΩ.CM）
※预处理+二级反渗透+EDI（电阻率≥15MΩ.CM）
Pre-treatment+ stage reverse osmosis system+EDI (electric conductivity≥15MΩ.CM）
※ 预处理+二级反渗透+脱气膜+EDI +抛光混床（电阻率≥18.25MΩ.CM）
Pre-treatment+ double stage reverse osmosis system+air film+EDI +polishing mixed bed (electric conductivity≥18.25MΩ.CM）
详情请联系：余艳13073396006,QQ:674831270）
详细工艺需根据原水设计情况进行设计
Details of the design process should be carried out according to the feed water quality.
纯水设备的主要特点
Main technics of pure water treatment equipment
▼结合电子工业用水连续生产的特性，采用了**膜法处理工艺（UF+RO+EDI）完成高纯水的制备工作；
The electronics industry with theacteristics of continuous production of water, using the entire membrane treatment process (UF + RO + EDI) to **plete the preparation of highly pure water work;
▼对于电子行业用水的特性，增强了对水中二氧化硅、重金属和有机碳的脱除；
Fthe water features of electronics industry , enhanced to removal silica, he**y metalsganic carbon in water.
▼采用了氮封水箱解决了电子工业用水要求较高，水的储存容易污染问题；
Using nitrogen sealed water tanks to so**e the problems of electronics industry require a higher water use, water storage easy to pollution ;
▼采用进口反渗透膜，脱盐率高，使用寿命长，运行成本低廉，产水水质高而稳定；
Adopted import reverse osmosis membranes, desalination rate is high, long serv** life, the operation cost is low, the output water quality is high stable.
▼在线水质监测控制，实时监测水质变化，保障水质安**；
On-line water quality monitoring co**ol, real-time monitoring of water quality to ensure safety of water quality.
▼**自动电控程序，还可选配触摸屏操作，使用方便，操作简单、安**；
Automatic co**ol procedure, also equipment with touch screen operation, easy to use, the operation is simple, safe.
▼切合当地水质的个性化设计，设想周到的堆叠式设计，占地面积小，**满足需求。
Correspond with the local water personalized design, considerate stackable design, small floarea, which can meet considerate needs.
▼运行费用及维修成本低，**自动运行，实现无人化管理操作。
Operating costs maintenance cost low, automatic operation, can realize unman** management operations
详情请联系：余艳13073396006,QQ:674831270
